Molecular beam epitaxy and characterization of ferroelectric quaternary alloy Sc0.2Al0.45Ga0.35N

Abstract

In this study, we demonstrate ferroelectricity in high-quality monocrystalline quaternary alloy ScAlGaN. Sc0.2Al0.45Ga0.35N films are grown by plasma-assisted molecular beam epitaxy and exhibit a surface roughness of 0.5 nm, limited by the roughness of the underlying molybdenum template. Polarization-electric field and positive-up-negative-down measurements reveal unambiguous ferroelectric switching with a coercive field of ∼5.5 MV cm−1 at 10 kHz and high remanent polarization of ∼150 μC cm−2. Time-dependent measurements suggest that the polarization reversal behavior adheres to the Kolmogorov–Avrami–Ishibashi model and follows a scheme of domain nucleation and growth. Detailed piezoresponse force microscopy studies further elucidate the evolution of polarity reversal domains in wurtzite nitride ferroelectrics and support the notion that the growth of inversion domains occurs via an in-plane motion of the domain walls. The realization of functional ferroelectric quaternary alloys in the wurtzite nitride family extends beyond being a technical demonstration. The additional degree of bandgap, band alignment, lattice parameter, and piezoelectric constant tunability achievable through quaternary alloys unveils a vast dimension through which wurtzite nitride ferroelectrics can be optimally engineered for a broad variety of high-performance electronic, optoelectronic, and acoustic devices and systems.