Abstract

The hunt for an ideal topological insulator, where the Dirac point is situated in a desirable energetic position and the bulk remains insulating, has motivated experiments on band structure engineering in these materials. To achieve this, ${\mathrm{Sb}}_{2}{\mathrm{Te}}_{3}$ and ${\mathrm{Bi}}_{2}{\mathrm{Te}}_{3}$ are commonly combined in ternary compounds or, less frequently, in heterostructures. Here we report on the growth of ${\mathrm{Sb}}_{2}{\mathrm{Te}}_{3}/{\mathrm{Bi}}_{2}{\mathrm{Te}}_{3}$ heterostructures by means of molecular-beam epitaxy. Using angle-resolved photoelectron spectroscopy, we are able to differentiate between the shift of the chemical potential and the changes in the electronic structure, causing the lift-off of the Dirac point away from the bulk valence band when varying the ${\mathrm{Sb}}_{2}{\mathrm{Te}}_{3}$ adlayer thickness. Our paper demonstrates that the important modulation of the surface states takes place for the very first ${\mathrm{Sb}}_{2}{\mathrm{Te}}_{3}$ layers, while thicker adlayers only cause a gradual change of the bulk states and a rigid shift of the chemical potential. Furthermore, we observe the occurrence of diffusion between the ${\mathrm{Bi}}_{2}{\mathrm{Te}}_{3}$ and ${\mathrm{Sb}}_{2}{\mathrm{Te}}_{3}$ layers and conclude that a growth at room temperature, followed by annealing, maintains an acceptable crystalline quality while substantially reducing the interdiffusion.

Highlights

  • In the recent topological insulator (TI) research, a great effort has been put into developing methods to tailor the band structure of the materials

  • For the growth of the Sb2Te3 layer, the substrate temperature was kept at 220 ◦C and the flux rates were kept at ≈0.5 Å/min for Sb and at ≈1.6 Å/min for Te, following the Te distillation method employed for the growth of Bi2Te3 [21,22,23,24]

  • Our results reveal that a direct access to the Dirac point by transport experiments can be facilitated via the growth of Sb2Te3/Bi2Te3 heterostructures, allowing for the measurement and use of the properties of the surfaces states only

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Summary

INTRODUCTION

In the recent topological insulator (TI) research, a great effort has been put into developing methods to tailor the band structure of the materials. Eschbach et al [17] studied heterostructures in which the thickness of the Sb2Te3 adlayer was varied from 6 to 25 QLs and observed a shift of the topological surface states. This shift of ≈200 meV is accompanied by a transition from n- to p-type dominated transport. We systematically study the evolution of the electronic structure of molecular-beam epitaxygrown Sb2Te3/Bi2Te3 heterostructures from very thin (1 QL) to thick (40 QLs) Sb2Te3 adlayers, with focus on the thin layers for which we expect the largest effects on the surface states to occur. Alternative growth procedures and its influence on the electronic structure

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