Modulating resistive switching in Ni0.5Zn0.5Fe2O4 memristors: The role of manganese doping concentrations

Abstract

Memristors, recognized as key devices for mitigating the von Neumann bottleneck, show great potential in non-volatile memory technology. Their performance is fundamentally linked to the chemical composition and structural characteristics of their intermediate dielectric layer. Owing to the inherent advantages of metal oxides, such as their simplistic chemical makeup and superior thermal stability, memristors featuring a Metal-Insulator-Metal (MIM) sandwich structure with metal oxides as the intermediate layer have received extensive focus. In this study, a Pt/Ni0.5Zn0.5MnxFe2-xO4(NZMFO)/Pt composite film was prepared, and its resistance switching behavior was modulated by altering the doping concentration of Mnn+ in NZMFO. The experimental results indicate that altering the Mnn+ doping concentration does significantly impact the content of oxygen vacancies. As the concentration of Mnn+ increases from 0.10 to 0.20 at.%, the content of oxygen vacancies correspondingly rises from 46.58 % to 76.42 %. Concurrently, variations in Mnn+ doping concentration significantly alter the resistance switching properties of the Pt/NZMFO/Pt composite films. This includes elevating the set/reset voltage, diminishing the resistance ratio, and enhancing the durability with the augmentation of Mnn+ concentration. By meticulously adjusting the Mnn+ doping concentration, we can achieve a memristor characterized by superior performance across all metrics. Considering all performance aspects, this study determined that the Pt/NZMFO/Pt thin film memristor with x = 0.15 exhibits adequate endurance (100 cycles), high data retention, and stable set/reset voltage. This work underscores the critical role of Mnn+ doping concentration in optimizing the electrochemical properties of NZFO memristors, illustrating a strategic pathway to engineer memristive devices with enhanced performance for future non-volatile memory applications.