Modulated optical reflectance measurements on bulk metals and thin metallic layers

Abstract

We present modulated optical reflectance experiments with several bulk metals as well as thin AlSi and Ti layers sputtered on SiO2 and Si substrates. The measurement technique is able to detect variations of thermal conductivity, layer thickness, and local thermal contact between metallization and substrate. Furthermore, it provides the possibility of characterizing effects of temperature processes on thin metallic films as used in microelectronic technology in a more sensitive way than sheet resistance does.