Abstract
A modified electron-beam-induced deposition method using a parallel beam of electrons is developed. The method relies on the buildup of surface potential on an insulating surface exposed to an electron beam. Presence of sharp edges on the insulating surface implies presence of large electric fields that lead to site-specific nucleation of metal vapor on those regions. Feature sizes as small as 20nm can be deposited without the need to use fine probes, and thus the limitation of probe size imposed on the resolution is overcome. The use of pure metal vapor also renders the process inherently clean.
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