Abstract
Temperature-responsive photo-cross-linkable poly[oligo(ethylene oxide) monomethyl ether methacrylate] (POEOMA)-based star polymers were synthesized by atom transfer radical polymerization (ATRP), for the modification of silicon (Si) wafer surfaces. The polymers showed a lower critical solution temperature (LCST) behavior in aqueous media. The polymers were modified with benzophenone (Bzp) functional groups that were utilized in UV-triggered (λ = 365 nm) cross-linking reactions for the preparation of polymer networks. The star polymers were deposited onto the surfaces of Si wafers by spin coating, and stable polymer films were formed by simple UV irradiation. The stability of thermoresponsive cross-linked polymer films deposited on the Si wafer was confirmed by changing their hydrophilicity by changing the temperature of the environment. In addition, the POEOMA-based star polymers could be utilized for the preparation of photolithography-patterned surfaces. The successful formation of uniform stable polymeric films indicates that Bzp-functionalized POEOMA star polymers can be used for a simple Si surface modification.
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