Abstract
The effect of 3.5 keV electron irradiation on adhesion and contact resistivity of the Ag/YBa2Cu3O7 interface has been studied using an evaporated silver layer on c-axis oriented superconducting YBa2Cu3O7 thin films. Electron doses ranged between 1016 and 1018 electrons/cm2. The Q-tip method of adhesion testing showed that even at the lowest electron dose adhesion is significantly improved. The contact resistivity of the interface was measured using a cross-junction four-point probe. Contact resistivity was unchanged at the lowest electron dose but increased as the electron dose increased. A theoretical model involving an electron irradiation damaged layer at the interface has been developed to explain measured contact resistivity changes.
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