Abstract

We studied the effect of surface enlargement on the efficiency of a muon (μ +) moderator by comparing the flux of epithermal μ + emerging from a solid Ar (s-Ar) layer deposited on a flat Al substrate with the fluxes from an Ar layer deposited on gratings manufactured in Si and Ag substrates. We developed a simple replication technique to emboss a Si grating into a thin Ag foil, where the gratings consist of V-shaped grooves with 20 μm depth and ridge distance of 30 μm on an area of 30×30 mm 2 . We obtain a gain in epithermal μ + flux of 1.5 with respect to that of a flat moderator geometry. The 15% reduction with respect to the geometrical enlargement factor of 1.73 is due to μ + absorption losses in the V-groove walls. The data imply a nearly isotropic angular distribution of epithermal μ + inside the s-Ar moderator and a reflection coefficient of about 80% for epithermal μ + impinging on s-Ar.

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