Abstract
Abstract Aerosol-Assisted Chemical Vapour Deposition (AACVD) can be used to manufacture, for example, transparent conducting oxides (TCOs), liquid crystal displays (LCDs) and light emitting diodes (LEDs). This paper presents an integrated model to support the scale-up of the AACVD process, which is comprised of three modules: aerosol generation, transport and delivery. Latin Hypercube Sampling (LHS) method is used to generate input data for the sensitivity and uncertainty analysis. Based on industrial ranges of process parameters, the incorporation of AACVD into current TCO industrial plants, without replacing their existing facilities, was found to be mainly impacted by the flow rates, the length of the transport system and the temperature of the chemical deposition site.
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