Abstract
This article addresses the dynamical behaviour of sputtered neutrals in the strong electric fields arising in industrial plasmas. Such particles are displaced from the substrate surface by the impacting plasma ions, and clearly must be present in the sheath region, directly above the substrate. It is argued here that the strong electric field gradient at the mouth of trench features extracts the neutrals from the vicinity of the substrate, contributing to the efficient exhausting of the unwanted material.
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