Abstract
Roll-to-roll (R2R) nano-manufacturing processes are critical in the manufacturing of electronic components for consumer products such as displays and flexible electronics. However, there are significant quality and process control challenges inherent to the control of R2R processes at nanometer scales. These challenges arise from the strong nonlinearities in the underlying phenomena, high levels of noise, and large measurement delays. This paper analyzes and evaluates the effectiveness of several control strategies in mitigating the challenges with control of R2R process steps. The proposed control strategies were tested on an experimentally derived model of an R2R physical vapor deposition (PVD) process, which simulates forward and double-pass R2R sputtering deposition procedures.
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