Modelling of the dual frequency capacitive sheath in the intermediate pressure range

Abstract

The nonlinearity of the plasma sheath in dual frequency capacitively coupled reactors is investigated for frequencies well above the ion plasma frequency. This work focuses on the behaviour of the voltage and the sheath width with respect to the driving current source and the collisionality regime. For typical plasma processing applications, the gas pressure ranges from a few milliTorrs to hundreds of milliTorrs, and the ion dynamics span different collisional regimes. To describe these different ion dynamics, we have used a collisionless model and a variable mobility model. The sheath widths and the voltages obtained from these two models have then been compared.