Abstract
Modelling of glow discharge (plasma) processes is illustrated by the formulation of a reaction engineering model for a radial flow, parallel plate plasma reactor. Features of the discharge structure are described along with a brief discussion of the modelling necessary to predict ion concentrations, electron density and energy. In the present case, electron density and energy are included as parameters in the reactor continuity balances. The industrially important etching of silicon in CF 4 is used as an example. The modeling equations are solved by finite element methods and the model predictions are used to demonstrate the influence of operating parameters on etch rate magnitude and uniformity.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
