Abstract
The paper presents the results of computer calculations of glow discharge plasma parameters in a hollow cathode zone and modeling of thermal and diffusion processes at local ion nitriding with a hollow cathode. The proposed model of a glow discharge with a hollow cathode with sufficient accuracy allowed to describe the distribution of plasma parameters in a cathode void. Values of plasma parameters in a cathode void formed by a mesh screen and cathode surface were obtained via the probe method. It was found that the use of hollow cathode effect allows to increase the concentration of ions near the treated surface by 1.5 times. The suggested computer model allows to predict the distribution of the temperature field and depth of a diffusion layer at local ion nitriding with a hollow cathode for various configurations and sizes.
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