Abstract

Pulsed laser deposition (PLD) in a low-pressure oxygen atmosphere is commonly used for the production of high-quality, stoichiometric zinc oxide thin films. An alternative approach that has the potential benefit of increased process control is plasma-enhanced PLD, i.e. the use of a low-temperature oxygen plasma instead of a neutral gas. So far, the development of PE-PLD, and PLD in general, has been hampered by a lack of detailed understanding of the underpinning physics and chemistry. In this paper, we present modelling investigations aimed at further developing such understanding. Two-dimensional modelling of an inductively-coupled radio-frequency oxygen plasma showed that densities of 1014–1015cm−3 of reactive oxygen species O and O2* can be produced for operating pressures between 3 and 100Pa. Together with the absolute densities of species, also the ratio between different reactive species, e.g. O and O2*, can be controlled by changing the operating pressure. Both can be used to find the optimum conditions for stoichiometric zinc oxide thin film deposition. Additionally, we investigated laser ablation of zinc using a different two-dimensional hydrodynamic code (POLLUX). This showed that the amount of material that is ablated increases from 2.9 to 4.7μg per pulse for laser fluences from 2 to 10J/cm2. However, the increased laser fluence also results in an increased average ionisation of the plasma plume, from 3.4 to 5.6 over the same fluence range, which is likely to influence the chemistry near the deposition substrate and consequently the film quality.

Highlights

  • The last decade has seen a significant expansion of research into zinc oxide (ZnO) films

  • Pulsed laser deposition (PLD) in a low-pressure oxygen atmosphere is commonly used for the production of high-quality, stoichiometric zinc oxide thin films

  • Because of its high melting temperature (~2000 °C), thermal evaporation of ZnO is impractical and alternative, more complex techniques are required. Techniques such as chemical vapour deposition (CVD), molecular beam epitaxy (MBE), magnetron plasma sputtering, and pulsed laser deposition (PLD) have all successfully been applied to fabricate ZnO films with properties desired for certain applications [4]

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Summary

Introduction

The last decade has seen a significant expansion of research into zinc oxide (ZnO) films. Controlled fabrication of high-quality thin films of ZnO is challenging. Because of its high melting temperature (~2000 °C), thermal evaporation of ZnO is impractical and alternative, more complex techniques are required. Techniques such as chemical vapour deposition (CVD), molecular beam epitaxy (MBE), magnetron plasma sputtering, and pulsed laser deposition (PLD) have all successfully been applied to fabricate ZnO films with properties desired for certain applications [4]. The PLD technique offers the advantage of high deposition rates, (limited) control of stoichiometry and easy interchange of materials. The main disadvantages are the limited area of deposition and possible incorporation of macroscopic particles in the films, generated during laser

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