Abstract
In this work a useful analytical approximation for the electric potential profile in the presence of an oblique magnetic field is suggested. It describes the potential profile dependence on the magnitude and angle of a magnetic field and plasma parameters in the Debye sheath and the magnetic pre-sheath. It is in good agreement with the Chodura and Stangeby solutions and respective PIC simulations performed with the SPICE2 code. The influence of the magnetic field inclination angle on the angle and energy distributions of ions which reach the wall, and thus on the effective sputtering, is analyzed for various first wall materials.
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