Abstract
The MMWICP (miniature microwave ICP) is a new plasma source using the induction principle. Recently Klute et al presented a mathematical model for the electromagnetic fields and power balance of the new device. In this work the electromagnetic model is coupled with a global chemistry model for nitrogen, based on the chemical reaction set of Thorsteinsson and Gudmundsson and customized for the geometry of the MMWICP. The combined model delivers a quantitative description for a non-thermal plasma at a pressure of p = 1000 Pa and a gas temperature of T g = 650–1600 K. Comparison with published experimental data shows a good agreement for the volume averaged plasma parameters at high power, for the spatial distribution of the discharge and for the microwave measurements. Furthermore, the balance of capacitive and inductive coupling in the absorbed power is analyzed. This leads to the interpretation of the discharge regime at an electron density of n e ≈ 6.4 × 1018 m−3 as E/H-hybridmode with an capacitive and inductive component.
Highlights
The MMWICP is a promising new plasma source which transfers the principle of inductive coupling successfully to a small jet and was first described in [1]
In this work we employed an existing electromagnetic model for the MMWICP and coupled it self consistently to a global model for a nitrogen plasma. It results a quantitative description for a non-thermal nitrogen plasma at a pressure of p = 1000 Pa and a gas temperature of Tg = 650–1600 K
This goes beyond previous modelling and enables a comparison with experimental data, including volume averaged plasma parameters, the spatial distribution of light emissions and the electrical field strength and microwave measurements
Summary
The MMWICP is a promising new plasma source which transfers the principle of inductive coupling successfully to a small jet and was first described in [1]. It is based on a specially designed resonator that acts as an LC-circuit with a high quality factor Q. The operation was successful for a wide pressure range of p = 50–1000 Pa and with different gases (argon, nitrogen, oxygen), the source is best studied for a nitrogen plasma at p = 1000 Pa. Nitrogen allows a very sensitive determination of the electron density using OES and the pressure of p = 1000 Pa is high enough to describe
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