Abstract

Two methods for the reduction of thermal cross talk (cross erase) and overwrite jitter in growth dominant phase change materials are addressed through simulations. An additional Au layer and a modified multipulse technique are considered. A model is described that simulates mark formation in growth dominant media. The disk with an additional Au layer is shown to reduce the temperature in adjacent tracks. The modified multipulse scheme, utilizes write power more efficiently and reduces the cross erase significantly. In growth dominant media, the main cause of overwrite jitter is shown to be the reduction in erasability with large marks at high velocities. Jitter is shown to be almost insensitive to parameters such as erase power, bias power at the cooling width region, and the length of the cooling width itself at high write powers. At lower write powers, clear minima in jitter are found for specific values of these parameters. At high write powers, jitter is substantially reduced using a modified multipulse scheme.

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