Abstract
A mathematical model for calculating the dependences of the parameters of self-organized germanium quantum dots (QDs) on silicon on the conditions of growth in molecular beam epitaxy is described. The energies of formation for pyramidal and wedge-shaped islands in the Ge/Si(001) system are calculated with allowance for the contributions from surface energy and elastic stress relaxation, and the drop in the energy of attraction between atoms and the substrate.
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Schedule a callMore From: Bulletin of the Russian Academy of Sciences: Physics
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