Modeling on Monolithic Integration Structure of AlGaN/InGaN/GaN High Electron Mobility Transistors and LEDs: 2DEG Density and Radiative Recombination

Abstract

The monolithic integration structure of the AlGaN/InGaN/GaN−based high electron mobility transistor (HEMT) and light−emitting diode (LED) is attractive in LED lighting and visible light communication (VLC) systems owing to the reduction in parasitic elements by removing metal interconnections. Due to the band−offset and polarization effect, inserting a certain thickness in the InGaN layer into the traditional AlGaN/GaN single heterostructure increases the density of 2DEG to nearly twice the original. At the same time, inserting the InGaN quantum well layer can also improve the luminous efficiency of LED. In this paper, the physical models of two−dimensional electron gas (2DEG) densities and the threshold voltage of AlGaN/InGaN/GaN HEMTs are established and verified with experimental results from the literature. According to the calculation results, the two−dimensional electron gas (2DEG) density in the AlGaN/InGaN/GaN HEMT is 1.47 × 1013 cm−2, and the two−dimensional hole gas (2DHG) density is 0.55 × 1013 cm−2, when Al% = 0.2, In% = 0.1, dAlGaN = 20 nm. In addition, a physical model for the radiative recombination rate in the monolithic integration structure of HEMT−LED is proposed. This work provides a design guideline for AlGaN/InGaN/GaN HEMT and its application in visible light communication systems.