Abstract
A modeling technique based on bond graph methods is used to analyze the mechanism of metal-organic chemical vapor deposition processes of RuO2 by Ru(C5H5)2. Theoretical models are considered and compared with experimental data. The most suitable model, which incorporates both the homogeneous gas-phase reactions and the heterogeneous surface processes, is constructed. The proposed model agreed well with the experimental data. The model indicates that besides a single-surface reaction there exists a gas-phase reaction which is the rate-controlling step. The surface deposition rate constant as well as the forward and backward reaction rate constants for the gas-phase reversible reaction of Ru(C5H5)2 are also determined.
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