Abstract
The formation of metal microstructures on metal substrates is theoretically analyzed by the example of local silver electrodeposition using the numerical simulation of interrelated electrochemical and homogeneous chemical reactions.The distributions of the concentrations of the participants in the reactions and the current density of silver ion reduction are calculated for various concentrations of solution components and interelectrode distances. The degree of localization of metal deposition depends on the distribution of the concentrations of electroactive silver cations and the nonelectroactive complex of this metal near the anode. The conditions for reaching the maximum rate of local silver electrodeposition are determined.
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