Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions

Abstract

A set of models is developed for a microsecond pulsed glow discharge, to describe the behavior of argon excited levels, including the metastables, as well as the cathodic sputtering and the behavior of sputtered copper atoms and ions. These models are coupled to a hybrid Monte Carlo–fluid model for electrons, argon ions and atoms, which was developed previously, to obtain an overall picture of the pulsed glow discharge. Typical results of the present model are the densities of copper atoms and ions, the level populations of argon and copper excited levels, the erosion rate due to cathode sputtering and the contributions due to argon ion, atom and copper ion bombardment, the rates of various collision processes in the plasma, as well as the optical emission intensities. The results are presented as a function of distance from the cathode and as a function of time during and after the pulse.