Abstract
AbstractWe develop a new approach to the modeling of thin film growth. Our model treats the adatom density on the surface of the film as an explict unknown. This approach (1) clarifies the role of the “uphill current” associated with the Schwoebel barrier; (2) facilitates simple, physically natural coupling to the mechanism of deposition; and (3) permits discussion of multispecies effects. Our implementation focuses on spiral mode growth of YBCO thin films, with MOCVD (Metallorganic chemical vapor deposition) as the deposition mechanism.
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