Abstract
The sputter-ion pump is a capture vacuum pump which operates by sputtering a getter material. Nowadays the most common design is based on a Penning trap. In this work we will study the operating principles of the pump and we will build a model that, starting from design parameters, allows us to simulate its performances. We will consider the ion pumps from Agilent Technologies as a reference for our simulation: the Agilent Diode VIP 40, 55 and 75.
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