Abstract
<para xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> In this paper, nonthermal plasma technology was used to remove nitric oxide (NO) from a mixture of air and water vapor. A chemical model was developed to obtain NO removal mechanism and to observe the behavior of the species in the plasma discharge. The influence of water vapor addition on NO removal efficiency was also investigated. Results obtained from the model indicate that the NO removal is mainly achieved by chemical reactions with <formula formulatype="inline"><tex>$\hbox{O}^{\bullet}$</tex></formula>, <formula formulatype="inline"><tex>$ \hbox{N}^{\bullet}$</tex></formula>, and <formula formulatype="inline"><tex>$\hbox{OH}^{\bullet}$</tex></formula> radicals. Experimental results of the NO removal process in a dielectric barrier discharge are also presented. Several experimental parameters such as power, frequency, initial concentration of NO, and specific input energy were tested, and a <formula formulatype="inline"><tex>$\hbox{NO}_{x}$</tex></formula> removal efficiency of approximately 98% was achieved. </para>
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