Abstract
Electroplated CoFe alloys demonstrating Joule magnetostriction (i.e., a large change in material shape induced by an applied magnetic field) have been recently developed for the creation of microfabricated magnetoelastic resonators for tagging applications. This development requires a measurement technique for evaluating film magnetostriction performance to provide feedback for optimization of the electrodeposition process. This technique must be suitable for electrodeposited films in terms of thickness and ease of processing, have the required sensitivity and dynamic range for accurate microstrain measurements in low magnetic fields up to saturation, and be cost competitive with commercial instruments. A new MEMS variable capacitor has been developed for this purpose that incorporates electroformed mechanical and electrical features as well as the electrodeposited film under test. This capacitor has a modeled 3 pF variable range covering microstrains up to 200 ppm. This presentation will cover the design, modeling, and characterization of these capacitors for magnetostriction measurements of CoFeB and CoFe electrodeposited films. This will also include a discussion of a custom printed circuit board for extracting capacitance signals during the magnetic field ramp inside of a superconducting quantum interference device (SQUID) magnetometer.
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