Abstract
Numerical simulations were used to investigate the influence of various hot filaments and other deposition parameters on substrate temperature field which affects significantly the growth and quality of diamond films by Electron-assisted Chemical Vapor Deposition (EACVD). The results show that the hot-filament parameters have great influence on the magnitude of the substrate temperature, the results also show that the hot-filament number, the substrate swing angle and the distance between the hot-filament and the substrate affect the uniformity of the substrate temperature field deeply. Diamond deposition experiments show that the uniform temperature field for the growth of the diamond can be obtained by optimizing the parameters of the hot-filament and the swing substrate.
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