Abstract
An analytical model of the sputtering of binary homogeneous targets by light ions bombardment has been developed, an analytical formula has been obtained, which makes it possible to calculate the total and partial sputtering coefficients of a binary (multicomponent) target by light ions bombardment. The calculation results are in good agreement with the experimental data. The patterns of preferential sputtering of two-component materials at low energies of bombarding ions are revealed.
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