Model of a low-pressure radio-frequency inductive discharge in Ar/O2 used for plasma spray deposition

Abstract

A global (volume-averaged) model of a low-pressure radio-frequency (RF) inductive discharge used for nanostructured zinc oxide thin film deposition, the so-called spray-plasma device, is proposed. The plasma reactor is fed with an admixture of argon and oxygen and the pressure is typically several tens of mTorr. In the first step of the modelling, the injector and the substrate holder are not taken into account, and therefore zinc-containing species are not considered. The global model is based on the numerical integration of the particle balance equations and the electronic power balance equation. The model is first run until the steady state is reached to determine the equilibrium discharge parameters that are the species densities and the electron temperature. A parametric study is carried out varying the gas pressure, the RF power and the O2 fraction in the reactor. A parameter of great importance for the deposition process is the flux of the reactive species on the substrate holder and the model allows a fast exploration of this parameter. For continuous plasmas, the ratio of the reactive species flux to the total positive ion flux can be controlled varying the three basic parameters cited before (pressure, power and dilution). In the last part of the paper, we also investigate pulsed plasmas and the effect of the duty cycle variations on the neutral/ion flux ratio.