Abstract
A model based analysis of corona charge - Kelvin probe measurement enables extension of this powerful non-contact electrical characterization metrology to patterned structures with multiple distinctly different elements within the probing area under the Kelvin probe. The model considers the geometrical dimensions, the electrical parameters of the elements of the patterned structure, and the response of each element to corona charging. Application of the model was verified on two types of patterned structures: a planar configuration with elements consisting of metal-oxide-semiconductor and oxide-semiconductor areas; and a three dimensional configuration with elements of trenches filled with metal and oxide-semiconductor. The model based QV method enables extraction of electrical parameters that are representative of the individual elements of the structure.
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