Abstract
In order to study the effect of diffraction focusing characteristics of microlens arrays on the parallel laser direct writing quality, we use nonparaxial approximation to analyze the diffraction focus characteristic of a single microlens, take into consideration the cross-talk effect of a number of microlenses on the diffraction focusing characteristics of an array, and establish a theoretical focusing intensity model of a microlens array to describe the influence of a change in F-number and/or center distance on the diffraction focusing characteristics of a parallel laser direct writing system while incident writing laser is normal. Numerical simulation results indicate that there is a cross-talk effect among microlenses which increases as the F-number increases when the center distance is the same as the smaller aperture, and parallel writing quality can be improved by reducing or totally eliminating the cross-talk effect by reducing F-number and/or increasing center distance.
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