MOCVD of Epitaxial Alkali-Earth Fluorides Thin Films

Abstract

Thin films of alkali-earth fluorides and multilayer structures including such layers are known as perspective materials for optics, photonics and chemical sensors. They can also be considered as a material for buffer layers for 2G HTSC wires. Here we report on growing epitaxial CaF2 and SrF2 films on different substrates by MOCVD. The films' properties were examined using RBS, SEM, EDX, XRD, EBSD and AFM. The obtained films revealed perfect in- and out-of-plane orientation and had a smooth, crack-free surface. Depending on the substrate and deposition conditions, some films required the recrystallization annealing to form the epitaxial layer or that of good texture. Additionally, a number of multilayer films including MF2 layers were grown. The obtained films were successfully used as substrates for HTS deposition.