Abstract
Zinc oxide (ZnO) nanowire (NW) arrays were grown on Si (100) substrate by metal-organic chemical vapor deposition (MOCVD) via Zn[TMHD]2 as precursor. Here we adopted two different procedures to grow ZnO NWs namely, colloid and sputtered Au pre-deposition on Si (100) substrate. Comparative studies based on the morphology and growth behavior of ZnO NWs were performed. The grown ZnO NWs were characterized by field-emission scanning electron microscopy (FE-SEM), Atomic Force Microscopy (AFM), Co-focal laser scanning microscopy (CLSM), and Raman spectroscopy.
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