MOCVD growth GaN on sapphire

Abstract

The n-type and p-type a-GaN films were successfully grown on a r-sapphire substrate, according to X-ray diffractometer and SEM results parameters measurement. The growth rate versus the growth temperature was investigated. The holes concentration (8x1017 cm−3) was achieved by the Cp2Mg flow optimization and the parameters of thermal annealing in nitrogen. The GaN film growth rate dependence versus temperature at a constant hydrogen flow through a TEG source was investigated. The results indicate that defects density is reduced upto 104 cm−2, the surface morphology uniformity was improved. During growth the influence from V/III flows ratio was detected.