Abstract
Electron-probe soft X-ray emission spectroscopy (SXES) has been applied to the nondestructive analysis of the buried interface of a Mn(thin-film)/Si(substrate) contact system, where the energy of the primary electrons, Ep, is varied below 20 keV. An important point of this analysis is that SXES gives a specific signal for each chemical element in different chemical bonding states. The Mn(thin-film)/Si(100) specimen not subjected to heat treatment did not show any additional phase except for Mn and Si at the interface region within the detection limit of the present experiment. The specimen subjected to heat treatment at 350°C for 3 min showed a layered structure of Mn/MnSi/MnSi1.7/Si(100) from the top to the substrate.
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