Abstract
Mn2O3–4TiO2 composite thin films were deposited on fluorine doped tin oxide (FTO) coated glass substrates from a solution of a newly synthesised hexanuclear single source molecular precursor [Mn2Ti4(TFA)8(THF)6(OH)4(O)2]·0.4THF 1 (where TFA=trifluoroacetato and THF=tetrahydrofuran) by aerosol-assisted chemical vapour deposition (AACVD) technique. The precursor 1 was characterised by melting point, elemental analysis, Fourier transform infra-red (FTIR) spectroscopy, proton nuclear magnetic resonance (1H NMR) spectroscopy, thermogravimetry/derivative thermogravimetry (TG/DTG) and single crystal X-ray analysis. The chemical composition and surface morphology of the fabricated thin film which have been determined by X-ray diffraction, scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDX), suggest the formation of impurity-free nanocrystalline mixtures of Mn2O3–4TiO2 composite with well-defined and evenly distributed particles in the size range of 112–308nm. The indirect optical band gap energies of 1.20 and 2.81eV were estimated by UV–Vis spectrophotometry. The current–voltage characterisation proved that the composite Mn2O3–4TiO2 electrodes exhibit n-type semiconducting behaviour. The maximum photocurrent density of 343μA/cm2 at 0.7V versus Ag/AgCl/3M KCl (∼1.23V versus RHE) was obtained for the Mn2O3–4TiO2 photoelectrode deposited at 450°C for 45min from 0.006M solution of 1 in THF.
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