Abstract
The low temperature regioselective hydrosilylation of various alkenes with (1,1,1,3,5,5,5-heptamethyltrisiloxane) MDHM is described using Mn2(CO)10 under UV irradiation with Mn loadings as low as 1 mol%, in the absence of additives and with excellent selectivity and yields. The generation of a manganese radical allowed the anti-Markovnikov hydrosilylation products to be selectively obtained in yields up to 99%.
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