Abstract
Mn-doped cubic GaN films were grown by plasma-assisted molecular beam epitaxy on GaAs (001) substrates. There was a strong influence of the Ga:N ratio on the Mn incorporation and a dramatic increase in the Mn concentration was observed for the layers grown under N-rich conditions. Hall-effect measurements unambiguously showed that the GaMnN samples had strong p-type conductivity. For both N-rich and Ga-rich growth conditions a bulk hole density of about 1018cm−3 was achieved with a corresponding mobility of >300cm2V−1s−1. This compares very favorably with other values reported for p doping of cubic GaN doped with C, suggesting that Mn may be a very suitable dopant for GaN-based electronic structures. The apparent values of ionization energy for Mn were around 50 meV, which is much shallower than for C or Mg in cubic GaN. In addition to a small high temperature ferromagnetic signal, a ferromagnetic correlation was detected among the remaining Mn ions at low temperatures, which is assigned to the onset of hole-mediated ferromagnetism in cubic GaMnN.
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More From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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