Abstract
The nucleation of a dipole of edge dislocations is theoretically investigated in a layer embedded in a nanofilm when the nanostructure is submitted to misfit stress. The effect of stress and nanofilm dimensions has been characterized on the introduction of the dipole of misfit dislocations, from the free surfaces to the centre of the layer. A stability diagram for the nanostructure is finally provided with respect to this particular defect nucleation.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
