Miniaturization process of three-dimensional nanostructures fabricated by focused-ion-beam chemical vapor deposition

Abstract

A miniaturization process for three-dimensional (3D) nanostructures fabricated by focused-ion-beam chemical vapor deposition was proposed in this study. Carbon nanostructures with a Ga–C core and C shell were miniaturized by controlling the diameter of the Ga–C core using annealing and removing the C shell using reactive ion etching. The process characteristics were also evaluated. Furthermore, we demonstrated the miniaturization of the 3D structures. As a result, the diameters of carbon nanopillars in an array were miniaturized from approximately 71 nm to approximately 17 nm. In addition, the proposed miniaturization process was useful to sharpen the edges of nanostructures.