Abstract
A small spectroscope with 25 color sensors was fabricated by combining metamaterial color filters and Si photodiodes. The metamaterial color filters consisted of guided-mode resonant metal gratings with subwavelength two-dimensional periodic structures. Transmittance characteristics of the color filters were designed to obtain peak wavelengths proportional to grating periods. For each color sensor, a peak wavelength of the spectral sensitivity could be tuned in the range of visible wavelengths by adjusting each grating period. By performing spectrum reconstruction using Tikhonov regularization, the spectrum of an incident light was obtained from the signal of photodiodes. Several monochromatic lights were made incident on the fabricated device and the spectral characteristics of the incident light were reconstructed from the output signals obtained from the respective color sensors. The peak wavelengths of the reconstructed spectra were in good agreement with the center wavelengths of the monochromatic lights.
Highlights
Color filters, which work as wavelength selective filters, have been used in image sensors and liquid crystal displays
Plasmonic color filters for many colors can be fabricated on the same substrate by a single fabrication process, unlike the conventional color filters using pigment
Plasmonic color filters have high compatibility with complementary metal–oxide–semiconductor and charge-coupled devices based on semiconductor microfabrication technologies, compared with color filters using conventional pigments
Summary
Color filters, which work as wavelength selective filters, have been used in image sensors and liquid crystal displays. Since the discovery of extraordinary transmission phenomenon based on surface plasmon by Ebbesen et al in 1998 [1], plasmonic color filters using metal nanostructures have been actively studied [2–6]. Plasmonic color filters have various advantages over the conventional color filters using pigment, such that various color characteristics can be realized depending on the structural shapes with thicknesses of just tens of nanometers. Plasmonic color filters for many colors can be fabricated on the same substrate by a single fabrication process, unlike the conventional color filters using pigment. Plasmonic color filters have high compatibility with complementary metal–oxide–semiconductor and charge-coupled devices based on semiconductor microfabrication technologies, compared with color filters using conventional pigments. In recent years, a nanoimprint technology in which submicron structures are formed using molds has been advanced [7–18], and improved productivity of plasmonic nanostructures can be expected
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