Migration Processes of the 30° Partial Dislocation in Silicon

Abstract

The migration processes of the 30 degrees partial dislocation in silicon have been investigated using first-principles total-energy calculations. We have presented for the first time a reliable determination of the formation and migration energies of kinks, which are consistent with experiments. The obtained results indicate that the 30 degrees partial dominates the dislocation dynamics in Si and suggest the dislocation glide picture based on the no-collision model. We suggest that the interpretation of experimental studies on the dislocation dynamics should be reexamined in light of these results.