Abstract
Scientific and methodical fundamentals are developed for the technology of manufacturing of microstructured Si anodes based on macroporous silicon. The main technological processes include the electrochemical etching of single-crystal silicon wafers that allows obtaining an ordered lattice of cylindrical macropores with a cavity between the porous layer and support, anisotropic shaping, formation of a copper contact, and separation of the silicon structure from the support. Microstructures are manufactured in the form of a grid, columns, and zigzags with thin monodispersed walls of different crystallographic orientation. The possibility of repeated use of the Si support for anodic treatment and the manufacturing of several anodic structures from a single plate Si wafer is shown. The performed electrochemical tests demonstrate that the anodes manufactured according to the developed technology sustain hundreds of charge–discharge cycles.
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