Abstract
Thick and hard chromium nitride (CrN) films have been developed by plasma assisted metal organic chemical vapor deposition (PAMOCVD) technique. The coating has been characterized using X-ray diffraction, scanning electron microscopy and analytical and conventional transmission electron microscopy. The coating exhibits two phenomena on different length scales: (i) formation of nanocrystals, and (ii) the formation of the globular structure on a micron scale. These globules are thought to be clusters of nanocrystalline CrN. Cross-sectional transmission electron microscopy of the film has revealed an extremely complex microstructure. However, the film has been found to have uniform Cr incorporation. The coating cross-section has shown bands of varying contrast. It has been shown that adhesion of the coating can be improved by corrugating the substrate surface.
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