Abstract
TiN/Mo2N nano-multilayer films with modulation period ranging from 3nm to 9.8nm were deposited by magnetron sputtering. TiN and Mo2N monolithic films were also deposited for comparison. It was found that the (200) preferred orientated TiN/Mo2N nano-multilayer films exhibited fcc structure similar to B1-NaCl and formed isostructural superlattice with well defined interfaces between TiN and Mo2N layers. The multilayer films with modulation periods λ=3nm and 5.7nm exhibited superhardness with a value of about 41GPa. Both the coefficient of friction and specific wear rate of multilayer films increased from 0.29 to 0.44 and 5.8×10−17m3/Nm to 1.3×10−16m3/Nm, respectively, with the increase of the modulation period. The TiN/Mo2N nano-multilayer films exhibited improved mechanical and tribological properties compared to TiN and Mo2N monolithic films.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
