Abstract
Hydrogenated amorphous silicon oxide (a-SiOx:H) is an attractive passivation material to suppress epitaxial growth and reduce the parasitic absorption loss in silicon heterojunction (SHJ) solar cells. In this paper, a-SiOx:H layers on different orientated c-Si substrates are fabricated. An optimal effective lifetime (τeff) of 4743 μs and corresponding implied open-circuit voltage (i Voc) of 724 mV are obtained on 〈100〉-orientated c-Si wafers. While τeff of 2429 μs and i Voc of 699 mV are achieved on 〈111〉-orientated substrate. The FTIR and XPS results indicate that the a-SiOx:H network consists of SiOx (Si-rich), Si– OH, Si– O– SiHx, SiO2≡Si– Si, and O3 ≡S– Si. A passivation evolution mechanism is proposed to explain the different passivation results on different c-Si wafers. By modulating the a-SiOx:H layer, the planar silicon heterojunction solar cell can achieve an efficiency of 18.15%.
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