Microstructure and tribological properties of SiO x/DLC films grown by PECVD

Abstract

The structural modification of pure DLC films was attempted by the addition of SiO structures into the DLC films. The chemical structures of SiO x /DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiO x /DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiO x /DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiO x /DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiO x /DLC films deposited at different bias voltages was investigated.