Abstract
The aim of this investigation is to achieve high transition temperature, low resistivity films under conditions suitable for use in all-NbN Josephson junction fabrication. For this purpose, the heteroepitaxy of NbN on MgO films is investigated. For substrate temperature of 200°C or thereabouts, polycrystalline MgO films of (200) orientation were formed on (100) silicon, (11̄02) α-Al2O3, and fused silica. Based on XTEM, HEED and X-ray data, heteroepitaxial growth ((100)NbN//(100)MgO) was obtained in NbN films and NbN/MgO/NbN trilayers deposited on (200) oriented MgO films. The epitaxial NbN films of 10 nm thickness had high transition temperatures of about 14 K, and relatively low residual resistivities of less than 200 µΩ·cm. Using the GL relationships, we calculated the Ginzburg-Landau parameters, λ(0) and ξ, of our NbN films in the dirty limit. The calculated ξ(4.2 K) and λ(0) are ∼4.5 nm and ∼300 nm, respectively.
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