Microstructure and Stress in Mo Films Sputttr-Deposited on Glass Substrates

Abstract

AbstractMo films are deposited on various glass substrates using the sputtering technique. The film stress and texture are greatly affected by the substrate materials. For the films grown on borosilicate glass both DC and RF sputtering may produce films with desirable properties. However, the films with compressive stress can be deposited on sodalime glass substrates only by RF sputtering. Preferred orientations are (211) and (110) for the film grown on borosilicate glass substrate and the film grown on sodalime glass substrate, respectively.